Cu-Co-Si系低Si侧扩散行为研究  

Diffusion behavior in the low Si region of a Cu-Co-Si system

作　　者：陈硕 马珂遹 李洪晓 任玉平 蒋敏 秦高梧 CHEN Shuo;MA Keyu;LI Hongxiao;REN Yuping;JIANG Min;QIN Gaowu(Key Laboratory for Anisotropy and Texture of Materials(Ministry of Education),School of Materials Science and Engineering,Northeastern University,Shenyang 110819,China)

机构地区：[1]东北大学材料科学与工程学院材料各向异性与织构教育部重点实验室,沈阳110819

出　　处：《中国体视学与图像分析》2022年第3期271-278,共8页Chinese Journal of Stereology and Image Analysis

基　　金：国家重点研发计划(No.2021YFB3803101)

摘　　要：本文采用固-固扩散偶技术,利用扫描电子显微镜(SEM)和能谱分析仪(EDS)对Cu-Co-Si系扩散偶的微观结构和成分分布等扩散行为进行了研究。结果表明,1000℃时扩散偶Co94Si6-Cu94Si6和Co90Si10-Cu94Si6均呈层状结构,均由Cu基固溶体、金属间化合物Co_(2)Si和Co基固溶体三个单相层组成;700℃时扩散偶Co94Si6-Cu94Si6的层状结构则是由Cu基固溶体、金属间化合物CoSi、金属间化合物Co_(2)Si和Co基固溶体四个单相层组成。扩散偶的扩散路径均偏向Co-Si侧;且扩散路径在两相区与共轭线平行。随Si元素含量的增加,Cu原子在Co基固溶体中的扩散速度加快。The diffusion structure and composition distribution of the solid-to-solid diffusion-couples in a Cu-Co-Si system were investigated by Scanning Electron Microscopy(SEM)and Energy Dispersive Spectrometer(EDS).The results show that the diffusion-couples Co94Si6-Cu90Si6 and Co90Si10-Cu90Si6 are both layered at 1000℃,and are composed of three single-phase layers:Cu-based solid solution,intermetallic compound Co_(2)Si and Co-based solid solution.The layered structure of diffusion-couple Co94Si6-Cu90Si6 at 700℃is composed of four single-phase layers:Cu-based solid solution,intermetallic compound CoSi,intermetallic compound Co_(2)Si and Co-based solid solution.The diffusion paths of the diffusion-couples are biased towards the Co-Si side and they are parallel to the tie-lines in the two-phase regions.With the increase of Si elemental content,the diffusion rate of Cu atoms in Cobased solid solutions accelerates.

关 键 词：Cu-Co-Si系 扩散行为 固-固扩散偶 扩散路径 

分 类 号：TG146.11[一般工业技术—材料科学与工程]