自动加标仪的研制及其在ICP-MS/MS分析电子级湿化学品痕量杂质元素中的应用  

Development of standard addition instrument and its application in analysis electronic grade wet chemicals by ICP-MS/MS

作　　者：舒旭伟 卢水淼 夏晓峰 姚继军 梅华灯 李伟东 SHU Xuwei;LU Shuimiao;XIA Xiaofeng;YAO Jijun;MEI Huadeng;LI Weidong(Hangzhou Puyu Technology Development Co.,Ltd.,Hangzhou 310052,China)

机构地区：[1]杭州谱育科技发展有限公司,杭州310052

出　　处：《微纳电子与智能制造》2022年第2期78-81,共4页Micro/nano Electronics and Intelligent Manufacturing

摘　　要：随着半导体产业的高速发展,尤其近年来集成电路朝着纳米级方向不断进步,使得对衬底硅片表面洁净度要求日益严格。现阶段多采用湿法化学清洗处理硅片表面,过程涉及多步清洗并使用多种高纯试剂,如H_(2)SO_(4)、HNO_(3)、HF、H_(2)O_(2)、NH_(3)·H_(2)O、HCl等。本文通过自研的加标仪配合三重四极杆电感耦合等离子体质谱仪,标准加入法检测复杂基体中痕量元素杂质。样品通过自吸模式稳定引入,经加标仪检测流速,根据预先设定加标程序,系统自动匹配添加量并持续稳定引入标准物质。加标仪的使用一方面消除基体干扰,另一方面避免加标过程因人工操作引入的结果偏差,检测结果满足ng/L级痕量元素杂质检测。With the rapid development of the semiconductor industry,especially in recent years,the integrated circuit continuously advances towards the nanoscale direction,making the surface cleanliness requirements of the substrate silicon wafer increasingly strict.At the present stage,wet chemical cleaning is the most popular way used to treat the silicon wafer surface,the process involves multistep cleaning and using a variety of high purity reagents,such as H_(2)SO_(4),HNO_(3),HF,H_(2)O_(2),NH_(3)·H_(2)O,HCl and so on.A self-developed standard addition instrument coupled with a triple quadrupole inductively coupled plasma mass spectrometer is used to detect trace element impurities in a complex matrix by standard addition method.The sample is introduced steadily through self-priming mode.After the flow speed is detected by sensor,according to the preset standard addition gradient,the system automatically matches the added amount and continuously introduces the standard substance.On the one hand,the use of the standard addition instrument eliminates the matrix interference,and on the other hand,it avoids the result deviation introduced by manual operation,the detection results meet the requirements of ng/L grade trace element impurity detection.

关 键 词：标准加入法 电感耦合等离子体质谱(ICP-MS) 痕量元素杂质 

分 类 号：TM712[电气工程—电力系统及自动化]