氡室氡浓度调控系统的研究  

Radon concentration control system of radon chamber

作　　者：刘良军[1] 周剑良[1] 孟冶成[1] 丘寿康[1] 肖德涛[1] 

机构地区：[1]南华大学氡实验室,湖南衡阳421001

出　　处：《核技术》2007年第6期553-556,共4页Nuclear Techniques

基　　金：湖南省科技厅重点资助项目(05FJ2003)资助

摘　　要：为一个2.84m3的氡室研制了一套氡浓度控制系统。采用控制氡室与外界换气量的方法调节氡室中氡浓度。换气量采用短周期开关控制的方法-脉冲宽度控制法(PWM),换气周期为10min。采用了氡快速补充和快速排放装置。氡室中使用一个扩散式固体氡源。系统用计算机自动控制,氡浓度建立时间小于4h,控制平稳,长时间稳定性优于2%。A radon concentration control system for a radon chamber (2.84m3) was developed. The radon concentration in the chamber can be controlled by adjusting air exhaust flow rate through the method of Pulse Width Modulation(PWM). A controlling cycle is 10 minutes, with a device to quickly supply and discharge radon. A solid radon source was used in the radon chamber. The system was controlled by computer. The equilibrium time of radon concentration was less than 4 hours. The stability of long time control was bet...

关 键 词：氡室 氡浓度 计算机控制 

分 类 号：TL82[核科学技术—核技术及应用]