基于B-Ge光纤Bragg光栅紫外曝光修整的研究  

Study on Trimming of B-Ge Fiber-based Bragg Gratings by UV Exposure

作　　者：赵志勇[1] 于永森[1] 卓仲畅[1] 张健[1] 郑伟[1] 张玉书[1] 

机构地区：[1]吉林大学集成光电子国家重点实验室,吉林长春130023

出　　处：《半导体光电》2003年第5期321-323,共3页Semiconductor Optoelectronics

摘　　要：　制作了基于B Ge光纤的Bragg光栅,并且提出对光栅进行紫外曝光修整的处理方法。这种方法对光栅的中心波长、光谱形状、边模抑制比具有较好的永久性的修整作用。另外,对B Ge光纤的光敏机理和光栅紫外曝光修整机理做了初步研究。The Bragg gratings are fabricated on the borongermanosilicate fiber(BGe fiber). A technique for trimming the Bragg gratings by the UV exposure is proposed. This method has a permanent effect on the parameters of the gratings, such as the wavelength, spectrum shape and side lobe. The mechanism of the photosensitization of the BGe fiber and the method of grating trimming are also discussed.

关 键 词：BGe光纤 BRAGG光栅 紫外曝光 

分 类 号：TN253[电子电信—物理电子学]