纳米SiO_2/光敏稀释剂改性EA光固化材料  

EA UV-curable Composite Materials Modified by Nano SiO_2/Photosensitive Active Diluents

作　　者：郑耀臣[1] 陈芳[2] 王慧敏[1] 任冬雪[1] 

机构地区：[1]烟台大学化工系,山东烟台264005 [2]威海鲁江实业有限公司,山东威海264200

出　　处：《材料科学与工程学报》2007年第5期768-771,共4页Journal of Materials Science and Engineering

摘　　要：以环氧缩水甘油醚、1,6-己二酸、丙烯酸、KH-550处理的纳米SiO2(HTSi-3)为主要原料合成了光敏稀释剂(AD)。环氧丙烯酸酯(EA)、AD、光引发剂和适量助剂配合制成光固化材料,测试了其光聚合反应特征、力学性能和耐热性。结果表明,由含HTSi-3的AD改性EA体系有较快的光固化速度和较高的光固化程度(DOC)。另外,用AD对EA改性后,提高了光固化材料的拉伸强度、冲击强度及耐热性。A novel photosensitive active diluents(AD) was synthesized from nano-SiO_2(HTSi-3),glycol diglycidyl ether,adipic acid and acrylic acid.UV curing composite materials were prepared from EA resin,AD,photo initiator,and the additives. The photo polymerization characteristics,mechanical property and heat-resistance capabilities of the UV-curing materials were also tested.The results indicate that the UV-curing composite material containing HTSi-3 was of faster reactive speed and of higher degree of cure(DOC).The UV cured composite materials modified by ADs exhibit high tensile strength,good impact strength and heat-resistant property.

关 键 词：纳米SiO3 光敏稀释剂 光固化材料 纳米复合材料 

分 类 号：TB332[一般工业技术—材料科学与工程]