采用新型无锡活化工艺在γ-Al_2O_3粉体上化学镀钯的研究  

Electroless palladium plating on γ-Al_2O_3 powders by a new activation method without using stannum

作　　者：王来军[1] 文明芬[1] 李玉山[1] 杨栋[1] 陈靖[1] 宋崇立[1] 

机构地区：[1]清华大学核能与新能源技术研究院201实验室,北京102201

出　　处：《现代化工》2006年第z1期191-193,195,共4页Modern Chemical Industry

基　　金：清华大学-中大集团博士后科学基金资助项目(20283600133)

摘　　要：采用一种新型无锡活化工艺,即利用乙二醇作还原剂直接使Pd2+被还原成Pd0而沉积在基体上,实现了对γ-Al2O3粉体的活化。将活化后的γ-Al2O3粉体加入到两种钯镀液中,成功实现了γ-Al2O3粉体上的化学镀钯。研究了活化的机理以及化学镀前后γ-Al2O3粉体结构与表面形貌的变化,结果表明通过新型化学镀方法制备出的镀钯粉体1-Pd/Al2O3中钯粒子的粒径在20~30nm,并且粒径大小分布均匀。新型无锡活化工艺与传统的化学镀活化工艺相比,活化过程中无锡离子干扰,并且活化在中性条件下进行,基体不受损坏。A new activation method to preseed palladium nuclei on γ-Al_2O_3 powders has been developed.The activation of γ-Al_2O_3 powders was accomplished by using ethylene glycol to reduce Pd^(2+) to Pd^0 on the surface of γ-Al_2O_3.Electroless palladium plating on the γ-Al_2O_3 powders was successfully realized by adding the activated powders into two kinds of electroless plating baths.The results showed that the Pd particles on the 1-Pd/Al_2O_3 were spherical with the average particle size of 2030 nm,and the size distribution of them was very homogeneous.In comparison with the traditional electroless plating process,the typical sensitization and activation steps using SnCl_2 can be omitted,and the supports can not be damaged because of not using acid and alkali.

关 键 词：化学镀钯 Γ-AL2O3 活化 乙二醇 

分 类 号：O647[理学—物理化学] TG171[理学—化学]