纳米SiO_2改性紫外光固化有机硅杂化材料研究  被引量:5

UV Curable Polysilicone Hybrid Materials Based on Nano-silica

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作  者:刘长利[1] 吴文健[1] 满亚辉[1] 张学骜[1] 钱斯文[1] 

机构地区:[1]国防科技大学航天与材料工程学院,湖南长沙410073

出  处:《材料工程》2006年第z1期75-78,共4页Journal of Materials Engineering

基  金:863创新基金项目(2003AA005017)

摘  要:合成了光敏性有机硅树脂PSUA,采用超声分散法将纳米SiO2分散在光敏性有机硅体系中,通过紫外光固化方式制备了光固化有机硅杂化材料.研究了纳米SiO2含量对杂化体系稳定性和光固化速率的影响,测定了光固化膜硬度,用扫描电镜观察了光固化膜断面形貌.实验结果表明,表面改性的纳米SiO2在杂化体系中分散比较均匀,稳定性好,能够有效增强光固化膜的硬度,但降低了光固化速率,杂化体系中纳米SiO2的用量以3%~5%为宜.A novel UV curable polysilicone urethane acrylate(PSUA) was synthesized.UV curable hybrid materials were prepared by dispersing modified nano-silica into UV curable PSUA.The stability,curing time and pencil hardness of the UV curable hybrid materials were studied.Scanning electron microscopy(SEM) was used to characterize the cross-section of hybrid materials.The results showed that modified nano-silica was dispersed into UV curable hybrid nanocomposites homogeneously and stably.It also demonstrated that the hardness of the hybrid materials was enhanced,while the curing speed was reduced.The appropriate mass fraction of modified nano-silica was 3%~5% mass.

关 键 词:光固化 有机硅 纳米二氧化硅 

分 类 号:O631[理学—高分子化学]

 

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