ICP-MS法分析过氧化氢、硝酸、硫酸中的金属杂质  

Determination of Metal Impurities in H2O2, HNO3and H2SO4 by ICP-MS

作　　者：黄曜[1] 黄郁芳[1] 

机构地区：[1]复旦大学材料系,上海,200433 复旦大学材料系,上海,200433

出　　处：《质谱学报》2005年第z1期15-16,共2页Journal of Chinese Mass Spectrometry Society

摘　　要：Inductively coupled plasma mass spectrometry (ICP-MS) was used to detect trace metal impurities in reagents such as H2O2, HNO3and H2SO4. The limit of detection to metal elements can be down to 2-20 ng/L in H2O2 and HNO3 and 0.1-1.0 ng/L in H2SO4.

关 键 词：inductively coupled plasma mass SPECTROMETRY (ICP-MS) metal IMPURITIES REAGENTS 

分 类 号：O657.63[理学—分析化学]