射频磁控溅射Ba_(0.6)Sr_(0.4)TiO_3薄膜表层结构研究  

The Structure Study of the Surface Layer of Ba_(0.6)Sr_(0.4)TiO_3 Thin Films Deposited by Radio Frequency Magnetron Sputtering

作　　者：廖家轩[1] 杨传仁[1] 张继华[1] 陈宏伟[1] 符春林[1] 唐章东[1] 冷文建[1] 

机构地区：[1]电子科技大学微电子与固体电子学院,成都610054

出　　处：《四川大学学报（自然科学版）》2005年第S1期178-182,共5页Journal of Sichuan University(Natural Science Edition)

基　　金：国家973重大基础研究计划项目(51310Z0J0)

摘　　要：用射频磁控溅射在Pt/Ti/Si O2/Si基体上,沉积了Ba0.6Sr0.4Ti O3(BST)薄膜,随后对其进行常规晶化和快速晶化,用XPS,GXRD和AFM研究了薄膜表层的结构特征.XPS表明,常规晶化的BST薄膜表层约3nm～5nm厚度内含有非钙钛矿结构的BST,随着温度的升高该厚度增加;而快速晶化时,该厚度减薄至1nm内,随着温度的升高没有明显增厚.元素的化学态表明非钙钛矿结构的BST并非来自薄膜表面吸附的含碳污染物(如CO2等),而与吸附的其他元素(如吸附氧等)对表层的影响有关.GXRD和AFM表明,致密的表面结构能有效地阻止吸附元素在BST膜体中的扩散,从而减薄含非钙钛矿结构层的厚度.Ba_ 0.6 Sr_ 0.4 TiO_3 (BST) thin films were deposited on Pt/Ti/SiO_2/Si substrates by radio frequency magnetron sputtering. The deposited BST films were crystallized with conventional thermal annealing (CTA) and rapid thermal annealing (RTA). X-ray photoelectron spectroscopy (XPS) experiments show that for the CTA annealed BST films much non-perovskited BST phase is observed in the surface layer and its distributing depth is 3～5nm and increased with the increase of annealing temperature, while for the RTA a...

关 键 词：BST 表层 结构 晶化 钙钛矿结构 

分 类 号：TN304.05[电子电信—物理电子学]