磁过滤对多弧离子镀(TiAl)N薄膜的影响  

Deposition and properties of high quality (TiAl)N hard coatings

作　　者：李成明[1] 张勇[1] 曹尔妍[1] 薛明伦[1] 

机构地区：[1]中国科学院力学研究所,北京100080

出　　处：《中国有色金属学报》2001年第z1期179-182,共4页The Chinese Journal of Nonferrous Metals

摘　　要：介绍了利用过滤电弧离子镀沉积 (TiAl)N薄膜初步的研究结果。在电弧靶材前沿的磁场作用下 ,有效减小了薄膜的宏观颗粒尺寸 ,并极大地降低了颗粒密度。同时 ,过滤电弧的作用 ,使偏压对膜成分的影响减弱 ,薄膜的硬度随膜中铝含量的增加而提高 ,(TiAl)N的抗氧化能力明显提高。Deposition and properties of (TiAl)N have been investigated by filter arc evaporation. The size and density of macroparticle in (TiAl)N films are considerably decreased under the basement of electron's and ion's movement in the straight filter. The bias voltage appears to be the main parameter controlling the final composition in the conventional arc evaporation process. But under the filter arc evaporation process, the influence of the bias voltage on the final composition of the (TiAl)N are abated. Increasing aluminum content leads to an increase in surface hardness. The oxidation resistance of the (TiAl)N is obviously superior to that of TiN film.

关 键 词：过滤电弧 薄膜 宏观颗粒 抗氧化性能 

分 类 号：TG172.44[金属学及工艺—金属表面处理]