辅助离子束功率密度对透明塑料上室温磁控溅射沉积ITO薄膜结构和形貌的影响  

Power Density and Microstructures of ITO Coating Sputtered at Room Temperature on Transparent Plastics

作　　者：望咏林[1] 颜悦[1] 温培刚[1] 伍建华[1] 张官理[1] 

机构地区：[1]北京航空材料研究院,北京100095

出　　处：《真空科学与技术学报》2008年第S1期1-4,共4页Chinese Journal of Vacuum Science and Technology

摘　　要：基于双极脉冲磁控溅射复合离子束辅助沉积的新工艺,在透明塑料聚碳酸酯基片上,常温制备了透明导电的铟锡氧化物(ITO)薄膜。重点研究了不同辅助离子束功率密度对ITO薄膜晶体结构和表面形貌的影响。结果表明:当离子束功率密度从52mW/cm2逐渐增加到436mW/cm2时,薄膜逐渐从非晶态转变为微晶态、直至长大为多晶态,晶体呈现(222)择优取向;薄膜在非晶态时表面相对平坦,随着晶粒的长大,表面均方根粗糙度Rq增加,并在离子束功率密度为436mW/cm2时最大。离子束功率密度进一步增大到680mW/cm2时,薄膜的晶体衍射峰强度变弱、峰的半高宽变大,表明晶粒尺寸变小;薄膜表面均方根粗糙度下降。离子束功率密度为252mW/cm2,ITO薄膜具有最佳综合光电性能.The indium tin oxides(ITO)coatings were deposited by ion beam assisted magnetron sputtering with dual-pole power supply at room temperature on transparent plastic polycarbonate substrates.The microstructures of the coating were characterized with X-ray diffraction(XRD)and atomic force microscopy(AFM).The results show that the ion-beam power density strongly affects the microstructures and optical properties of the coating.For example,as the ion beam power density increases from 52 mW/cm2 to 436 mW/cm2,its a...

关 键 词：铟锡氧化物薄膜 室温制备 离子束辅助磁控溅射 结构与形貌 透明塑料衬底 

分 类 号：TB381[一般工业技术—材料科学与工程]