激光聚焦扫描扇区掩模制作光电码盘新方法  

A Novel Fabrication of Photoelectrical Encoder by Laser Focus Scanning Fan-mask

作　　者：赵立新[1] 胡松[1] 王肇志[1] 罗正全[1] 

机构地区：[1]中国科学院光电技术研究所,成都610209

出　　处：《微细加工技术》2007年第6期8-11,共4页Microfabrication Technology

摘　　要：为了改进光电码盘的制作工艺,提高效率,降低成本,提出了一种光电码盘的光刻方法。通过计算机控制激光聚焦扫描扇区掩模制作来选择扇区掩模的码道,采用光学光刻的方法制作码盘,取消了传统码盘光刻的精缩物镜和穿孔带。同时,扫描光斑远大于直写光斑,大大提高了加工效率。阐述了高斯光斑的腰束半径与扫描步距的关系,分析了扫描场能量分布的不均匀度,并给出了曝光实验的光刻效果。结果表明,该方法能够满足光电码盘的制作要求,成功地取代了光电码盘的传统制作方法,具有很好的工程应用前景。To improve the fabrication technology of photoelectrical encoder,the laser lithography method was introduced.Laser beam was focused and fan-mask was exposed with the control of computer.Based on the scanning principles,the relationship between scanning step and the characters of Gauss laser spot were expounded,The energy distribution of scanning field was analyzed,and the non-uniformity mainly depends on the stability of laser power,is about 3.2%.According to the experimental result,the requirements of encoder's fabrication are satisfied: the technique could be used successfully in photoelectrical encoder fabrication,it has been proved costless and efficient at engineering application.

关 键 词：光电码盘 扇区掩模 高斯光斑 聚焦扫描 

分 类 号：TN24[电子电信—物理电子学]