电沉积Ni-S合金硫含量的影响因素  

Dependences of sulfur content during electro-deposition of Ni-S alloys

作　　者：刘芳[1] 何捍卫[1] 周科朝[1] 袁铁锤[1] 刘红江[1] 李军 

机构地区：[1]中南大学粉末冶金国家重点实验室,长沙410083 [2]中船重工集团公司七一八研究所,邯郸056027

出　　处：《粉末冶金材料科学与工程》2005年第1期60-64,共5页Materials Science and Engineering of Powder Metallurgy

基　　金：国家八六三计划资助项目(编号2003AA305980)

摘　　要：用电沉积法制备了Ni-S合金电极,研究了电流密度、镀液温度、镀液pH值、电沉积时间、硫脲浓度对镀层硫含量的影响;测试了不同硫含量的极化曲线;并用XRD、SEM对镀层进行了表征.结果表明:硫含量随着电流密度、pH值的增高而降低,随着镀液温度的升高、电沉积时间增长而增高;在硫脲浓度为100 g/L时硫含量最高.硫含量在12.5%～16.5%时,Ni-S合金电极析氢电位较低.所获得的镀层有Ni3S2活性成分,并有部分非晶态.镀层经电解后,变得更细,更均匀.Ni-S alloy electrode was prepared by means of chemical electro-deposition method. The effects of current density, temperature, pH value, depositing time and thiourea concentration on sulfur content in the electro-deposited Ni-S electrode were studied. Polarization curves with different sulfur contents were determined. The phase and microstructure analysis were characterized by means of XRD and SEM. The results show that the sulfur content decreases with increasing current density and pH value, and increases with increasing temperature and electro-depositing time. With 100g/L thiourea concentration, the sulfur content reaches the max value. The lowest hydrogen-evolution overpotential achieve when the sulfur content is 12.5%16.5%. The coating contains Ni_3S_2 grain phase and partial amorphous structure, which becomes finer and more uniform after being electrolyzed.

关 键 词：Ni-S合金 硫含量 析氢电位 

分 类 号：TQ153.2[化学工程—电化学工业]