DF/HF化学激光器喷管氟原子壁面复合计算研究  

Numerical study of fluorine wall-recombination in DF/HF chemical laser nozzle

作　　者：李兰[1] 华卫红[1] 袁圣付[1] 姜宗福[1] 

机构地区：[1]国防科学技术大学光电科学与工程学院203室,湖南长沙410073

出　　处：《红外与激光工程》2007年第z1期357-360,共4页Infrared and Laser Engineering

摘　　要：氟原子在流场中的分布对DH/HF化学激光器的运行有着重要的影响。在数值模拟中利用FLUENT中带有的壁面反应模型,对基于其开发的流场计算方法加入了氟原子壁面复合计算,并将结果与CHAMBER计算结果进行了比较,表明该模型经修正可直接应用于DF/HF化学激光器流场计算。The concentration of fluorine-atom in DF/HF chemical laser’s flow field played an important role in its operation.In order to study the distribution of fluorine-atom,the wall surface reaction model was applied to compute wall-recombination of fluorine.The numerical results was also compared with CHAMBER’s.The comparison indicates that the model in FLUENT can be used directly after modified.

关 键 词：壁面复合 化学激光器 FLUENT 

分 类 号：TN248.5[电子电信—物理电子学]