聚合物9×9阵列波导光栅复用器的工艺研究  

Research on Technology of Polymer 9×9 Arrayed Waveguide Grating Multiplexer

作　　者：赵禹[1] 陈开鑫[1] 张大明[1] 崔占臣[2] 王菲[1] 马春生[1] 衣茂斌[1] 

机构地区：[1]成光电子学国家重点联合实验室吉林大学实验区,吉林长春130023 [2]吉林大学化学学院,吉林长春130023

出　　处：《半导体光电》2002年第3期178-181,共4页Semiconductor Optoelectronics

基　　金：国家重点基础研究发展规划项目 (G2 0 0 0 0 36 6 0 4 );国家高技术研究发展计划 (2 0 0 1AA312 16 0 )资助

摘　　要：首次采用铝掩模工艺制备出 9× 9硅基聚合物阵列波导光栅 (AWG)复用器。结果表明 ,在AWG器件制作工艺上 ,铝掩模技术明显优于厚胶掩模技术。用这种技术制备的器件 。A 9×9 polymer arrayed waveguide grating (AWG) multiplexer using aluminum as the mask has been fabricated for the first time. The results indicate that the technology using aluminum as the mask is superior to that using the thick photoresist as the mask in AWG fabrication. The structure target of fabricated device using this technology accords with the theoretic design.

关 键 词：聚合物 阵列波导光栅 掩模技术 

分 类 号：TN256[电子电信—物理电子学] TN205