Adsorption behavior of hexadecyltrimethylammonium bromide (CTAB) to mica substrates as observed by atomic force microscopy  

作　　者：ZHAO Feng1,2, DU Yukou1, YANG Ping1, LI Xingchang2 & TANG Ji’an2 1. Chemistry and Chemical Engineering Department, Suzhou University, Suzhou 215006, China 2. Key Laboratory of Colloid and Interface Science, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100080, China Correspondence should be addressed to Tang Ji’an (email: [e-mail]) 

出　　处：《Science China Chemistry》2005年第2期101-106,共6页中国科学（化学英文版）

摘　　要：Atomic force microscopy is employed to study the adsorption behavior of CTAB to mica surfaces. Results show that conformational transitions from globular micelles→cylindrical micelles→flat films are observed in the process of the adsorption of CTAB to mica at twice the bulk critical concentration. However, in 0.5 cmc CTAB solution, the adsorbed CTAB molecules to mica form the layered film structures, and apparent conformational transitions do not appear. Meanwhile, the phenomena of the adsorption of CTAB to mica and the dissociation of mica sur- faces are periodically observed.Atomic force microscopy is employed to study the adsorption behavior of CTAB to mica surfaces. Results show that conformational transitions from globular micelles→cylindrical micelles→flat films are observed in the process of the adsorption of CTAB to mica at twice the bulk critical concentration. However, in 0.5 cmc CTAB solution, the adsorbed CTAB molecules to mica form the layered film structures, and apparent conformational transitions do not appear. Meanwhile, the phenomena of the adsorption of CTAB to mica and the dissociation of mica sur- faces are periodically observed.

关 键 词：ATOMIC force microscopy (AFM)  micelle  behavior of adsorption  the DISSOCIATION of MICA surfaces. 

分 类 号：O647.3[理学—物理化学]