L-半胱氨酸自组装膜对铜的缓蚀功能研究  

Inhibition Study of L-Cysteine Self-assembled Films on Copper Corrossion

作　　者：白英奇[1] 王春涛[1] 李波 畅云仙 

机构地区：[1]太原师范学院化学系,山西太原030031 [2]山西职业技术学院,山西太原030006

出　　处：《山西大学学报（自然科学版）》2011年第4期621-626,共6页Journal of Shanxi University(Natural Science Edition)

基　　金：山西省教育厅高校科技开发项目(20101117);山西省自然科学基金(201101107-2)

摘　　要：在金属铜表面上制备了L-半胱氨酸自组装膜,采用循环伏安法、电化学交流阻抗以及极化曲线研究了各种浓度的L-半胱氨酸溶液制备的自组装膜对铜的缓蚀性能,研究发现,1×10-3 mol/L的L-半胱氨酸溶液的自组装膜在0.5mol/L的NaCl溶液中有较好的缓蚀效果,缓蚀效率84.9%.The self-assembled films of L-cysteine were prepared on copper surface.Electrochemical impedance spectroscopy(EIS) and polarization curves and cyclic voltametry were employed to investigate the formation mechanism and electrochemical properties of the self-assembled films on the surface of the copper electrodes.The L-cysteine self-assembled films formed in 1×10-3 mol/L solution had better inhibited effection,the inhibition efficiency was 84.9%.

关 键 词：自组装膜 交流阻抗 循环伏安法 L-半胱氨酸 

分 类 号：N55[自然科学总论]