PR方程结合HV混合规则计算HFC/HFC和HFC/HC二元混合物气液相平衡  

Calculation of vapor liquid equilibria of HFC/HFC and HFC/HC binary mixtues using PR EOS with HV mixing rule

作　　者：朱君悦[1] 段远源[1] 许心皓[1] 杨震[1] 

机构地区：[1]清华大学 热科学与动力工程教育部重点实验室 二氧化碳资源化利用与减排技术北京市重点实验室,北京100084

出　　处：《热科学与技术》2012年第3期241-245,共5页Journal of Thermal Science and Technology

基　　金：国家自然科学基金资助项目(U0934006);高等学校博士学科点专项科研基金资助项目(20100002110045)

摘　　要：氢氟烃(HFC)/氢氟烃和氢氟烃/碳氢(HC)混合物是两类重要的制冷工质。采用PR状态方程结合Horon-Vidal(HV)混合规则对7种HFC/HFC和7种HFC/HC二元混合物的气液相平衡性质进行了计算,并与PR状态方程结合van der Waals(vdW)混合规则的计算结果进行了对比。结果表明,HFC/HFC体系组元性质比较接近,非理想性不强,vdW混合规则即可达到较理想计算效果,HV混合规则对计算精度的提升有限;对非理想性较强的HFC/HC体系,vdW混合规则对共沸性质的描述不够理想,HV混合规则可以显著提升相平衡的计算精度。HFC/HFC and HFC/HC mixtures are two kinds of important refrigerants for industrial applications.The PR equation of state(EOS) combining with the Huron-Vidal(HV) mixing rule was established to calculate the vapor liquid equilibria properties of classical HFC/HFC and HFC/HC binary mixtures.A comparison of the calculation results between HV and van der Waals(vdW) mixing rule combined with PR EOS was made.The results showed that,compared with vdW mixing rule,the HV mixing rule has a limited improvement for HFC/HFC calculation precision while the HV mixing rule can obviously enhace the calculation precision for HFC/HC binary mixtures.

关 键 词：气液相平衡 PR状态方程 HV混合规则 氢氟烃 碳氢 

分 类 号：O642.42[理学—物理化学]