Effect of Ti cap layer thickness on microstructures and magnetic properties of Ti/Ni/Ti films  

作　　者：封顺珍 徐芹 东艳晖 马志春 刘继宏 孙会元 

机构地区：[1]College of Physics and Electric Information Engineering,Shijiazhuang University [2]College of Physics Science and Information Engineering,Hebei Normal University [3]Key Laboratory of Solar Activity,National Astronomical Observatories,Chinese Academemy of Sciences

出　　处：《Journal of Rare Earths》2010年第S1期406-408,共3页稀土学报（英文版）

基　　金：Project supported by the National Natural Science Foundation of China (10847119);the Natural Science Foundation of Hebei Proince (A2009000254, A2010001942);the Foundation of Hebei Provincial Education Department (Z2010167);the Foundation of Key Laboratory of Solar Activity of National Astronomical Observatories of Chinese Academemy of Sciences (KLSA2010-06)

摘　　要：Nanogranular Ti(3 nm)/Ni(30 nm)/Ti(t nm )(t=1,3,5,7,10) films were prepared by facing magnetron sputtering from Ti and Ni onto glass substrates at room temperature.The structural and magnetic properties of films strongly depended on the Ti layer thickness.X-ray diffraction(XRD) patterns of all as-deposited films showed strong FCC Ni(111) peak.Vibrating sample magnetometer(VSM) measurements indicated that the perpendicular coercivity of the Ti(3 nm)/Ni(30 nm)/Ti(3 nm) film reached about 36 kA/m.With the increase of Co layer thickness,coercivity(Hc) first increased and then decreased.The grain size and magnetic clusters slightly increased and the value of roughness(Ra) was smallest at t=3 nm.Nanogranular Ti(3 nm)/Ni(30 nm)/Ti(t nm )(t=1,3,5,7,10) films were prepared by facing magnetron sputtering from Ti and Ni onto glass substrates at room temperature.The structural and magnetic properties of films strongly depended on the Ti layer thickness.X-ray diffraction(XRD) patterns of all as-deposited films showed strong FCC Ni(111) peak.Vibrating sample magnetometer(VSM) measurements indicated that the perpendicular coercivity of the Ti(3 nm)/Ni(30 nm)/Ti(3 nm) film reached about 36 kA/m.With the increase of Co layer thickness,coercivity(Hc) first increased and then decreased.The grain size and magnetic clusters slightly increased and the value of roughness(Ra) was smallest at t=3 nm.

关 键 词：magnetron sputtering perpendicular coercivity magnetic films stress anisotropy 

分 类 号：TB383.2[一般工业技术—材料科学与工程]