Preparation of novel methyl methacrylate/fluorinated silsesquioxane copolymer film with low surface energy  

作　　者：GALY Jocelyne GéRARD Jean-Franois 

机构地区：[1]Université de Lyon,INSA Lyon,UMR CNRS 5223,Ingénierie des Matériaux Polymères

出　　处：《Science China Chemistry》2010年第9期2000-2005,共6页中国科学（化学英文版）

基　　金：supported by the European Community through RTN funded under the 5th frame work programm (HPRN-CT-2002-00306, NBB-HYBRIDS);National Natural Science Foundation of China (50873082);Research Fund for the Doctoral Program of Higher Education (20070384047);Scientific and Technological Innovation Flat of Fujian Province (2009J1009, 2010J01306)

摘　　要：Random copolymers of methyl methacrylate and fluorinated polyhedral oligomeric silsesquioxane(F-POSS) were synthesized and the corresponding thin films were prepared from solvent casting.Their microstructure was confirmed by 1H NMR,elemental analysis and GPC.Separation occurs in the bulk of the film during solvent evaporation which can be evidenced by Transmission Electron Microscopy,TEM,with POSS-rich nanophase sizes from 20 to 50 nm.Nanostructuration is attributed to the self-assembly of F-POSS due to the cluster-cluster interactions resulting from the nature of their ligands,i.e.,cycloaliphatic ligands and perfluorinated chains.Thermogravimetric analysis was used to investigate the thermal degradation temperature.It was shown that when F-POSS content is higher than 2.8 mol%,the incorporation of F-POSS could improve the thermal stability of PMMA significantly.In addition,it was shown that these fluorinated POSS-based copolymer surfaces could reduce the surface energy and could be used to design water-repellant nanocomposite coatings.Random copolymers of methyl methacrylate and fluorinated polyhedral oligomeric silsesquioxane(F-POSS) were synthesized and the corresponding thin films were prepared from solvent casting.Their microstructure was confirmed by 1H NMR,elemental analysis and GPC.Separation occurs in the bulk of the film during solvent evaporation which can be evidenced by Transmission Electron Microscopy,TEM,with POSS-rich nanophase sizes from 20 to 50 nm.Nanostructuration is attributed to the self-assembly of F-POSS due to the cluster-cluster interactions resulting from the nature of their ligands,i.e.,cycloaliphatic ligands and perfluorinated chains.Thermogravimetric analysis was used to investigate the thermal degradation temperature.It was shown that when F-POSS content is higher than 2.8 mol%,the incorporation of F-POSS could improve the thermal stability of PMMA significantly.In addition,it was shown that these fluorinated POSS-based copolymer surfaces could reduce the surface energy and could be used to design water-repellant nanocomposite coatings.

关 键 词：POSS PMMA NANOSTRUCTURE thermal stability surface properties 

分 类 号：O631[理学—高分子化学]