高纯氧化钇涂层制备工艺及性能研究  

Preparation of High Purity Yttria Coating and Research on the Performance

作　　者：任先京[1] 冀晓鹃[1] 侯伟骜[1] 魏伟[1] 沈婕[1] 

机构地区：[1]北京矿冶研究总院,北京100044

出　　处：《热喷涂技术》2009年第1期25-29,共5页Thermal Spray Technology

摘　　要：本文采用等离子喷涂方法制备高纯抗等离子体冲蚀氧化钇涂层,对喷涂参数进行优化,研究喷涂工艺对涂层结合强度、孔隙率、粗糙度、均匀性等性能的影响,在等离子反应室内进行了涂层贴片的抗等离子冲蚀试验研究。结果表明,电流、气体流量等热喷涂工艺参数对涂层力学性能影响较大,高纯氧化钇粉末的粒度分布影响涂层的微观组织,获得了满足抗等离子冲蚀速率要求条件下的涂层最大孔隙率。The yttria plasma corrosion resisting coating was prepared by air plasma spraying. The spraying parameters were optimized. The effects of spraying parameters on bond strength,porosity,roughnessuniformity of coating were investigated. The plasma corrosion resisting of the coating was held in plasma reaction chamber. It is indicated that current,gas-flow rate have the effects on the mechanical property of the coating,the size distribution of the yttria powders has the effects on the microstructure,and the max porosity was obtained which met the corrosion rate requirement.

关 键 词：氧化钇 等离子喷涂 孔隙率 抗等离子冲蚀 

分 类 号：TG174.442[金属学及工艺—金属表面处理]