化学溶液沉积法制备超疏水氧化锌薄膜  

Preparation of Super-hydrophobic ZnO Films by Chemical Solution Deposition Method

作　　者：黎卓华[1,2] 何新华[1,2] 陈志武[1,2] 徐浚楠 

机构地区：[1]华南理工大学材料科学与工程学院,广州510640 [2]湘潭大学低维材料及其应用技术教育部重点实验室,湘潭411105

出　　处：《人工晶体学报》2009年第S1期122-125,共4页Journal of Synthetic Crystals

基　　金：广东省科技计划项目(2007A010500012);低维材料及其应用技术教育部重点实验室开放课题资助课题(KF0701);华南理工大学国家大学生创新性实验计划(B09-Y9080040)

摘　　要：采用化学溶液沉积法在涂覆ZnO缓冲层的玻璃衬底上制备超疏水ZnO薄膜。利用SEM、XRD和水接触角测量表征薄膜的微观结构和润湿性。结果表明:在涂覆ZnO的玻璃衬底上所沉积的ZnO膜为单分散的ZnO纳米棒阵列膜。ZnO纳米棒的形状和尺寸与氢氧化钠浓度、化学反应速度和沉积时间有关。氢氧化钠浓度较高时所获得的是细长浓密的纳米棒阵列膜,提高反应速度会降低ZnO纳米棒的均匀性和形状规则性。经硅烷偶联剂处理后所得薄膜与水的接触角达到165°。Super-hydrophobic ZnO films were prepared on ZnO coated glass substrates by chemical solution deposition method.The microstructure and wettability of ZnO films were characterized by means of SEM,XRD and water contact angle measurement.The results showed that mono-dispersed ZnO nanorod array films were fabricated on ZnO coated glass substrates.The morphology and size of ZnO nanorods are dependent on the concentration of NaOH,reaction rates and times.Longer and denser ZnO nanorod arrays were obtained using high concentration of NaOH.The uniformity and regularity of ZnO nanorods are decreased by increasing reaction rates.ZnO films with a contact angle of 165 ° are achieved after the modification of alkylsilicane.

关 键 词：ZNO 纳米棒 超疏水 化学溶液沉积 

分 类 号：TB383.2[一般工业技术—材料科学与工程]