Linearity of Removal in the Proeess of Optical Element Polishing  

光学零件抛光的线性去除

作　　者：辛企明[1] 

机构地区：[1]北京理工大学工程光学系,北京100081

出　　处：《Journal of Beijing Institute of Technology》1992年第2期122-131,共10页北京理工大学学报（英文版）

摘　　要：In the light of some assumptions that are very close to the practical working conditions,a very complicated polishing process of optical element can be simplified as a linear and shift invariant system that is relatd only to the speed,pres- sure and time of processing.In polishing,the removed material can be represented and entreated by the convolution of the removal function of polishing head and the dwell function.The properties of removal function are presented.The assumptions and methods given by the author have been shown to be correct and applicable by experiments using a ring lap to polish the optical surfac.由于采用了一些与实际加工情况很接近的假设,非常复杂的光学零件的抛光加工过程可以被简化成仅仅与速度、压力以及作用时间有关的线性和不随位置而变化的系统.抛光中,材料的去除量可以用抛光头的去除函数与驻留函数的卷积求出.论述了去除函数的特性.用环形抛光模抛光光学表面的实验结果证明作者提出的假设和方法是正确而可行的.

关 键 词：optical element POLISHING convolution/linear and shift invariant system 

分 类 号：TH706[机械工程—仪器科学与技术]