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机构地区:[1]Microeleetronics Center, Academia Sinica, Beijing 100010, PRC [2]Shanghai Institute of Testing Technology, Shanghai 200233, PRC
出 处:《Chinese Science Bulletin》1992年第18期1516-1519,共4页
基 金:Project supported by the National Natural Science Foundation of China.
摘 要:Ⅰ. INTRODUCTIONMass interference is a chemicophysics phenomenon often generated in ion probe analysis. When measuring the concentration distribution of impurities implanted in Si, the mass interference produced by mass interference ions with the nearly same ratio of mass to charge (m/e) as the ions to be measured usually results in serious measurement errors. The above two kinds of ions cannot be segregated from each other because the mass resolution of mean ion probe is not high enough. In the case of eliminating edge effect ions
关 键 词:DEPTH ANALYSIS MASS INTERFERENCE ion.
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