STUDIES ON THE REACTION OF SILICON DIOXIDE ON GASEOUS HYDROGEN FLUORIDE  

作　　者：洪啸吟 李钟哲 郭永宁 董桂荣 

机构地区：[1]Department of Chemistry, Tsinghua University, Beijing 100084, PRC [2]Beijing Municipal Institute of Chemical Technology, Beijing 100084, PRC

出　　处：《Chinese Science Bulletin》1992年第3期259-260,共2页

基　　金：Project supported by the National Natural Science Foundation of China

摘　　要：The reaction of SiO₂ on hydrogen fluoride is a well-known and important reaction, which occurs under mild condition. But it has been found out that such a reaction on gaseous hydrogen fluoride （angydrous HF or gydrofluoric acid vapor）differs from that

关 键 词：FLUORIDE gaseous BOILING IRRADIATED coated ETCHING KETONE FLUORINE assist readily 

分 类 号：N[自然科学总论]