STUDY ON THE CHEMICAL BOND OF THE PHOTOSENSITIVE DYES TO THE MONOCRYSTALLINE SILICON SURFACE  

作　　者：陶鹰翔 郝纪祥 张祖训 曹子祥 

机构地区：[1]Department of Chemistry, Northwest University, Xi'an 710069, PRC [2]Department of Physics, Northwest University, Xi'an 710069, PRC

出　　处：《Chinese Science Bulletin》1991年第22期1874-1877,共4页

基　　金：Project supported by the National Natural Science Foundation of China

摘　　要：Since the 1980’s, with the rapid development of photoelectric semiconductor technology, photoelectric devices have been used in more and more fields. But due to the limit of the properties of semiconductor materials themselves, there are still many problems in photoelectric transform, spectral response range and so on. For example, the

关 键 词：PHOTOSENSITIVE DYE BOND monocrystallin SILICON SURFACE 

分 类 号：N[自然科学总论]