吸附氘和注入氘对钛膜微观结构的影响  

Microstructure of Titanium Films after Absorbing Deuterium Gas or Irradiated by Deuterium Ions

作　　者：刘际伟[1] 王博宇[1] 

机构地区：[1]中国工程物理研究院,四川绵阳621900

出　　处：《稀有金属材料与工程》2013年第S2期292-295,共4页Rare Metal Materials and Engineering

摘　　要：利用X射线衍分析射仪、慢正电子湮没技术和扫描电镜对Mo衬底上钛膜吸氘或注入氘前后的微观结构进行表征。结果表明:吸附氘改变了钛膜物相结构,注入氘未改变钛膜的物相结构;原始钛膜和吸附氘后的钛膜中缺陷分布均匀,吸附氘增加了钛膜缺陷浓度,载能氘粒子的注入对钛膜造成较大损伤;吸附氘对钛膜表面形貌无影响,由于选择性烧蚀,注入氘后钛膜表面不均匀性降低。Titanium films,deposited onto molybdenum substrates,were then loaded with deuterium gas or implanted deuterium ion in electrostatic accelerator.Effects of absorbing or implanting deuterium on the microstructure of titanium films were studied by X-ray diffraction,scanning electron microscopy and slow positron annihilation technique.X-ray diffraction analysis of the films shows the single phase of the titanium and molybdenum in pure titanium films and titanium deuteride and molybdenum phase peaks in the titanium film after absorbing deuterium.The phase structure of pure titanium films is changed by absorbing deuterium,but not by implanting deuterium.The slow positron annihilation technique reflects a uniformity of defect in the depth direction before and after absorbing deuterium,and a large increase of defects after deuterium implantation,which indicates that the defect structure of the titanium films is changed by implanting deuterium.Scanning electron microscopy reflects the surface morphology of titanium films is not changed by absorbing deuterium.The non-uniformity on the surface of the titanium films decreases as a result of selective ablation under implanted deuterium.

关 键 词：钛膜 微观结构 慢正电子湮没技术 

分 类 号：TB383.2[一般工业技术—材料科学与工程]