卫星深层充电特征研究  

Characteristics of the Internal Dielectric Charging Process of Satellites

作　　者：周庆[1] 

机构地区：[1]天津市技术物理研究所,天津300192

出　　处：《东华理工大学学报（自然科学版）》2013年第S2期102-104,共3页Journal of East China University of Technology(Natural Science)

摘　　要：通过MCNP软件模拟部分卫星介质深层充电特征。航天器介质平板充电过程简化为电子穿过屏蔽物质进入到介质聚四氟乙烯。模拟出没有屏蔽层时介质内部产生最大电场对应的介质厚度;增加屏蔽物质Al对介质内部产生最大电场的影响;不同屏蔽Al厚度最介质内部产生的最大电场的影响。We simulate part of the process of the internal medium charging by MCNP,simplify the spacecraft medium flat panel charging process to the process electrons go through the screen of aluminiums into Teflon. We simulated the max thickness of medium Corresponding to the maximum electric field produced by internal medium without shielding layer; the impact on the maximum electric field generated in medium when we increase the amount of shielding material( Al); the max impact on electric field generated in medium of different thickness of shielding material( Al).

关 键 词：MCNP 深层充电 电子 

分 类 号：V442[航空宇航科学与技术—飞行器设计]