阴极等离子体电解沉积Co、Cr金属涂层及Ni-Cr、Co-Cr合金涂层  

Preparation of Co and Cr metal coatings,and Ni-Cr and Co-Cr alloy coatings by cathode plasma electrlytic deposition

作　　者：权成[1] 何业东[1] 

机构地区：[1]北京科技大学北京市腐蚀,磨蚀与表面技术重点实验室,北京100083

出　　处：《材料热处理学报》2015年第6期185-190,共6页Transactions of Materials and Heat Treatment

基　　金：国家自然科学基金(51171021)

摘　　要：采用阴极等离子体电解沉积的方法制备了Co、Cr金属涂层以及Ni-Cr、Co-Cr合金涂层,并研究了不同主盐浓度和酸浓度对涂层结构和形貌的影响。结果表明,在阴极等离子体电解沉积过程中,涂层形貌演变规律主要取决于沉积速率和等离子体电弧的作用。较低的主盐浓度和较高的酸含量可以降低沉积速率,在等离子体电弧的作用下,沉积物可以充分地快速熔融并凝固,形成均匀、致密的涂层;而在较高的主盐浓度和较低的酸含量下,由于沉积速率快,大量的沉积物无法完全被等离子体电弧熔融,所以易形成枝晶或者粉末。Co,Cr metal coatings and Ni-Cr,Co-Cr alloy coatings were prepared by cathode plasma electrolytic deposition( CPED). The influence of main salt concentration and acid concentration on the structure and morphology of the coatings was investigated. It is found that,in CPED process,the morphology evolution of the coatings is determined by the depositing rate and the effect of plasma arcs.Uniform and dense coatings are deposited with lower main salt concentration and higher acid concentration,because the deposits with slower depositing rate can be melted by plasma arcs sufficiently. Rough or dendritical coatings are obtained with higher main salt concentration and lower acid concentration,since the deposits with faster depositing rate are weakly affected by the plasma arcs.

关 键 词：阴极等离子体电解沉积 金属涂层 合金涂层 沉积规律 

分 类 号：TG174.4[金属学及工艺—金属表面处理]