钛膜表面氧气氧化层研究  

The Study on Oxide Layer on the Surface of Titanium Film in the Oxygen

作　　者：刘文科[1] 曹小华[1] 彭述明[1] 龙兴贵[1] 李宏发[1] 杨茂年[1] 张晓红[1] 颜登云[1] 王维笃[1] 杨本福[1] 

机构地区：[1]中国工程物理研究院核物理与化学研究所,绵阳621900

出　　处：《材料导报》2004年第5期92-94,共3页Materials Reports

基　　金：中国工程物理研究院行业预研基金(20020536);中国工程物理研究院核物理与化学研究所科技创新基金(421040403)

摘　　要：研究了钼基钛膜表面氧气氧化工艺;用XRD分析了氧气氧化层的物相,其物相随氧化条件而异,含有Ti、TiO_2、TiO、Ti_2O、Ti_3O和Ti_6O等多种物相;用XPS研究了氧气氧化层钛的主要价态,其主要价态为+4、+3和+2价;用AES深度剖析研究了氧气氧化层的厚度,并研究了温度、氧气压力和时间对氧气氧化层厚度影响的规律;所有氧气氧化层均不与腐蚀介质发生作用,证明了该氧化层致密连续。Researching process of oxidation in the oxygen is conducted on the surface of titanium film of molybdenum substrate. The phase of oxide layers changes with the condition of oxidation by XRD analysis, including such phases as Ti, TiO_2, TiO, Ti_2O, Ti_3O and Ti_6O. Titanium valence mainly comprises +4, +3 and +2 on the surface of oxide layer by XPS analysis. The thickness of the oxide layer is analyzed by AES depth profile, and the law of influence of temperature, oxygen pressure and time on the thickness of the oxide layer is studied respectively. All oxide layers do not react with corrosion medium, proven that the oxide layers are compact and continuous.

关 键 词：氧化层 钼基钛膜 氧化工艺 腐蚀介质 贮氢材料 

分 类 号：O647.11[理学—物理化学] TG139.7[理学—化学]