一种高温超导YBaCuO薄膜图形形成方法  

A NEW METHOD OF PATTERNING HIGH-T_c SUPERCONDUCTING YBaCuO THIN FILMS

作　　者：戴建国[1] 李元[1] 康琳[1] 杨森祖[1] 

机构地区：[1]南京大学信息物理系,南京210008

出　　处：《低温物理学报》1993年第3期234-239,共6页Low Temperature Physical Letters

摘　　要：本文提出了一种高温超导薄膜图形形成的方法。该方法融多层光刻工艺和Ar^+铣技术于一体,用该方法刻蚀出的高T_cYBaCuO薄膜图形的T_c、J_e与刻蚀前薄膜的T_C、J_e相比,无明显下降。实验中使用的YBaCuO薄膜是在ZrO_2(100)基片上采用对靶偏轴DC磁控溅射原位生长得到的。作为尝试,用该方法成功地制备出YBaCuO Josephson薄膜微桥结。结的T_c为86K。在液氮温度下,经36.5GHz、90GHz微波辐照分别观察到清晰的多个微波感应台阶。结的临界电流和正常态电阻的乘积I_cR为1.5mV左右。A new method of patterning high-Tc superconducting YBaCuO thin films, which combines the multilayer chemical wet etching and Ar+ ion milling techniques, is discribed. Films of YBaCuO grown on ZrO2 (100) by facing targets and off-axis DC magnetron sputtering. The Tc and Jc of the patterning superconducting films has no obvious degradation. As a sample, the microbridge of YBaCuO thin film has been fabticated successfully using this method. These mi-crobridges exhibit zero restance at 86K. When microwave of 36. 5 GHz and 90GHz is exposed to the bridge, clear microwave induced steps are observed. Sharpiro steps are observed up to 740μV at 78K for 90 GHz radiation. The IcR product of the bridge is about 1. 5mv, where Ic and R are the eritical current and normal resistance of the bridge, respectively.

关 键 词：超导膜 图形形成 约瑟夫森结 高温 

分 类 号：O511.9[理学—低温物理]