反射式NEA光电阴极Cs-O层厚度的在线测试  

On-Line Measurement for Cs-O Layer Thickness of NEA Photocathode

作　　者：富容国[1] 常本康[1] 宗志园[1] 钱芸生[1] 

机构地区：[1]南京理工大学电子工程与光电技术学院,南京210094

出　　处：《光学与光电技术》2004年第3期28-29,共2页Optics & Optoelectronic Technology

摘　　要：提出了对 NEA 光电阴极的 Cs-O 层厚度进行在线测试方法,介绍了 NEA 光电阴极评估系统的结构,随后介绍了在 NEA 光电阴极制备过程中的光谱响应的变化,得到了响应曲线。通过对响应曲线的在线测试,以获得 NEA光电阴极 Cs-O 层的最佳厚度,根据实验结果提出了结论。A method of on-line thickness measurement for Cs-O for NEA photocathode is suggested. The structure of the evaluation system of Negative Electron Affinity photocathode is introduced. The change of the spectral response of NEA photo-cathode is tested during the process of manufacturing the NEA photo-cathode, the responding curves are obtained, the optimum thickness of Cs-O for NEA photocathode is achieved. At last the conclusion is given according to the experiment results.

关 键 词：NEA光电阴极 光谱响应 积分灵敏度 在线测试 

分 类 号：O462[理学—电子物理学]