射频磁控溅射腔面镀膜半导体激光器的可靠性  

Reliability of Semiconductor Laser with RF Magnetron Sputtering Facet Coating

作　　者：鲁鹏程[1] 郭伟玲[1] 邹德恕[1] 刘莹[1] 崔碧峰[1] 李建军[1] 沈光地[1] 

机构地区：[1]北京工业大学电子信息与控制工程学院,北京市光电子技术实验室,北京100022

出　　处：《固体电子学研究与进展》2004年第2期229-232,共4页Research & Progress of SSE

基　　金：国家 973基金资助项目 ( G2 0 0 0 0 683 -0 2 ) ;北京市自然科学基金 ( 4 0 3 2 0 0 7) ;国家 863计划资助项目 ( 2 0 0 2 AA3 12 0 70 ) ;国家重大项目国家自然科学基金 ( 6988960 1)

摘　　要：利用射频磁控溅射法对半导体激光器的腔面镀 Si O2 膜 ,并对镀膜后的器件在恒定电流下进行了加速寿命实验 ,结果表明镀膜后器件的特性得到了很大改善。器件平均输出功率提高了 49.8% ,平均阈值电流下降了 7% ,平均斜率效率提高了 5 0 % ,而且射频磁控溅射方法所镀的膜具有粘附性好、膜层致密、厚度易控制、稳定性好、成本低等优点 ,器件的可靠性也有明显提高。Semiconductor lasers with and without SiO 2 facet coating by RF magnetron sputtering are fabricated. Accelecrated aging tests of these devices are carried out at constant current stress. The results show that the device characteristics are improved greatly after RF magnetron sputtering facet coating. Average output power increases by 49.8%, average threshold current decreases by 7% and average slope efficiency increases by 50%. RF magnetron sputtering facet coating has the merits of good adhesion, film compact, thickness manageable, process steady and inexpensive. Device reliability is also enhanced after facet coating.

关 键 词：半导体激光器 射频磁控溅射 腔面镀膜 可靠性 

分 类 号：TN365[电子电信—物理电子学]