氨络合物体系电积镍的机理研究  

Nickel Electrodeposition Mechanism from Leaching Solution Containing Ammonia and Chloride

作　　者：郑国渠[1] 郑利峰[1] 张昭[2] 曹华珍[1] 张九渊[1] 

机构地区：[1]浙江工业大学材料科学与工程研究所,杭州310014 [2]浙江大学化学系,杭州310027

出　　处：《有色金属》2004年第3期45-48,共4页Nonferrous Metals

基　　金：国家自然科学基金项目 ( 5 0 0 0 40 0 5 );浙江省教委科研项目 ( 2 0 0 0 0 0 5 4)

摘　　要：采用电化学阻抗谱技术研究不锈钢电极上氨络合物体系电积镍的阻抗行为。结果表明 ,氨络合物体系电积镍阻抗谱有 3个时间常数 ,即高频区双电层电容和电化学反应电阻引起的容抗弧 ,中频区中间吸附产物NiOHads弛豫过程引起的感抗弧 ,低频区吸附氢原子对镍电结晶阻滞作用引起的容抗弧。探讨NiOHads吸附覆盖度与电化学阻抗谱的关系 ,提出电极反应机理和等效电路模型。Electrodeposition mechanism of nickel from leaching solution containing ammonia and chloride is investigated by means of electrochemical impedance spectroscopy. Three time constants for EIS characters are indicated by the results. At high frequency the capacitive loop, it is ascribed to the electrochemical double-layer capacity, at medium frequency the inductive loop is attributed to the relaxation of the electrode coverage by an adsorbed intermediate such as  NiOH ads , and at low frequency the capacitive loop may be due to the inhibition of nickel electrodeposition by adsorbed hydrogen. The relationship between electrode coverage by  NiOH ads  and EIS is discussed, and the mechanism and equivalent circuit of nickel electrodeposition are also proposed on the basis of the analysis of electrochemical impedance spectroscopy.

关 键 词：有色金属冶金 镍 电积 氨络合物 电化学阻抗谱 反应机理 

分 类 号：TF815[冶金工程—有色金属冶金]