坡莫磁阻薄膜的热处理研究  

Studies of Annealing Effects on Thin Magnetoresistive Permalloy Films

作　　者：章岚[1] 郭懋端 徐梅娣 

机构地区：[1]中科院上海冶金所,上海200050

出　　处：《功能材料》1993年第5期399-401,共3页Journal of Functional Materials

摘　　要：研究了坡莫磁阻薄膜的热处理工艺对电磁性能和组织结构的影响。通过溅射样品退火处理前后的X射线和TEM分析表明退火后(111)织构加强,堆垛层错减少,晶粒长大,缺陷减少。退火后电阻率下降,各向异性磁阻提高,但软磁性能没有改善,这些是与微结构变化相联系的。The effects of annealing on the electrical resistivity, anisotropic magnetoresistivity and hysteresis loop were studied on sputtered permalloy thin films. X-ray techniques and transmission electron microscopy were used to investigate the microstructure of unannealed and annealed permalloy films. The decrease of the resistivity was attributed to the increase of the average crystallite size and the reduction of defects after annealing. The increase of the anisotropic magnetoresistivity was related to the enhancement of the (111) preferential orientation. The magnetic properties were also slightly changed by the annealing treatments and these might be ascribed to the reduction of the shape anisotropy when the stacking faults were decreased after annealing.

关 键 词：坡莫磁阻薄膜 堆垛层错 热处理 

分 类 号：TG162.7[金属学及工艺—热处理]