光瞳滤波光刻图形质量影响因素分析  

The factors of influence on quality of patterns in pupil filtering photo-lithography

作　　者：陈旭南[1] 石建平[1] 罗先刚[1] 康西巧[1] 

机构地区：[1]中国科学院光电技术研究所微细加工光学技术国家重点实验室,四川成都610209

出　　处：《微纳电子技术》2004年第9期41-43,共3页Micronanoelectronic Technology

基　　金：国家自然科学基金资助项目(69876041)

摘　　要：在阐述投影成像光刻光瞳滤波技术原理与滤波器设计的基础上,详细分析研究了滤波成像光刻图形质量影响因素。指出影响图形质量的因素除了滤波器设计本身存在误差,主要还存在滤波器的制作误差、滤波器在成像光路中放置的位置误差和光刻工艺条件等因素。实验表明只有注意控制好这些影响因素,才能很好挖掘该技术提高光刻分辨力、增大焦深的潜能。Under the description of the theory of the pupil filtering photolithography(PFL)and the design of the filter,we focus on the analysis of the factors of influence on quality of patterns in PFL,and point out that the fabrication errors of the filter,the position errors of the filter in the photolithography system,and the technical conditions in photolithography influence the quality of the patterns strongly. Certainly the design errors of the filter also influence the result. The experiments on PFL show that no other than to control these factors finely,we can discover the potential of PFL to improve the resolution of the photolithography system and simultaneously to extend the focal depth.

关 键 词：光瞳滤波 光刻图形质量影响因素 分辨力 焦深 

分 类 号：TN305.7[电子电信—物理电子学]