硅烷化单晶硅表面自组装ZrO_2薄膜及其摩擦学性能研究  

Preparation and Tribological Behavior of ZrO_2 Thin Film through Self-assembled Processing

作　　者：王金清[1] 刘晓红[1] 许世红[2] 杨生荣[1] 

机构地区：[1]中国科学院兰州化学物理研究所固体润滑国家重点实验室,甘肃兰州730000 [2]兰州高等师范专科学校化学系,甘肃兰州730070

出　　处：《机械工程材料》2004年第9期41-44,共4页Materials For Mechanical Engineering

基　　金：国家自然科学基金资助项目(50375151和50272068);863计划资助项目(2002AA423230和2002AA302609)

摘　　要：利用自组装成膜技术在磺酸化的MPTS自组装单层薄膜表面制备了ZrO2薄膜,应用接触角测定仪、X射线光电子能谱仪(XPS)、原子力显微镜(AFM)分析了薄膜的组成和结构。结果表明:该ZrO2薄膜比较致密、无裂缝,呈"准二维"特征,且与基底的牢固性好。摩擦磨损试验表明:ZrO2薄膜经500℃烧结处理后适于在低负荷、低滑动速度下作为减摩、抗磨保护性涂层。Silane coupling reagent (3-mercaptopropyl) trimethoxysilane was prepared on single-crystal Si substrate to form two-dimensional self-assembled monoalyers (MPTS-SAM) and the terminal -SH group in the film was in-situ oxidized to -SO_3H group to endow the film with good chemisorption ability. And then ZrO_2 thin films were deposited on the oxidized MPTS-SAM, by enhanced hydrolysis of zirconium sulfate (Zr(SO_4)_2·4H_2O) solution in the presence of HCl at 70℃, making use of the chemisorption ability of the -SO_3H group. The atomic force microscopy (AFM) analysis indicates that the as-deposited ZrO_2 thin films were compact and crack-free, showing quadratically-looking features. The ZrO_2 films annealed at 500℃ for 2h showed excellent wear-resistance as they slided against AISI-52100 steel ball at a normal load of 0.5N tested in an unidirectional dynamic/static friction precision measurement apparatus. The ZrO_2 film was well adhered to the MPTS-SAM, it might find promising application in the surface-modification of single crystal Si and SiC in microelectromechanical systems (MEMS).

关 键 词：自组装单层薄膜 氧化锆薄膜 摩擦学性能 

分 类 号：O647[理学—物理化学]