电沉积Ni-Co合金工艺条件的研究  

Study on Process of Ni-Co Alloys Electrodeposition

作　　者：李艳[1] 

机构地区：[1]桂林工学院材料与化学工程系,广西桂林541004

出　　处：《化工技术与开发》2004年第4期5-7,共3页Technology & Development of Chemical Industry

摘　　要：研究了硫酸镍 -硫酸钴 -氯化钠体系中钴含量在 4 0 %以下的 Ni- Co合金镀层的影响因素。讨论了温度、p H、电流密度、Ni/ Co质量比、时间等因素对镀层沉积速度和腐蚀速度的影响。通过试验得出了电沉积过程的最佳工艺条件。In the system of NiSO_4·6H_2O,CoSO_4·7H_2O and NaCl, the influence factors of Ni-Co alloys coat which the content of Co was less than 40%, were studied.These factors, such as temperature, pH value, current density, electroplating time and the mass ratio of Ni to Co, have been discussed. The optimum technological conditions have been obtained through orthogonal experiment.

关 键 词：NI-CO合金 Ni-Co镀层 电沉积 沉积速度 

分 类 号：TQ153.2[化学工程—电化学工业]