中温酸性化学镀镍络合剂的研究  被引量:11

Study on complexants of acidic electroless nickel plating at middle temperature

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作  者:邹建平[1] 贺子凯[1] 黄鑫[1] 石杰[1] 

机构地区:[1]昆明理工大学材料与表面工程研究所,云南昆明650093

出  处:《电镀与涂饰》2004年第5期19-21,52,共4页Electroplating & Finishing

基  金:红塔集团合作项目(21002)。

摘  要: 通过考察乳酸、丙二酸、柠檬酸以及无机酸L浓度对工艺的影响,确定了合适的中温酸性化学镀镍工艺,其中复合络合剂由乳酸与无机酸L组成,含量均为10mL/L。测定了该中温酸性化学镀镍的沉积速度以及镀层的结合力、硬度、耐蚀性与磷含量,并通过扫描电镜观察了镀层的形貌及微观结构。结果表明,该中温化学镀镍层光亮平整、结构致密均匀、显微硬度可达480HV,耐硝酸点蚀时间大于180s,磷含量为7 50%,镀速达20μm/h。该工艺可与高温化学镀镍媲美。An optimal process of middle-temperature acidic electroless nickel plating was obtained by studying the influences of lactic acid content, malonic acid content, citric acid content and inorganic acid content on the process. The complexant in the bath is composed of lactic acid and inorganic acid whose contents are both 10 mL/L. The deposition rate,adhension, hardness, corrosion resistance and phosphorus content of the deposits obtained by the process were tested. The surface morphology and micro-structure were discussed with SEM. The results show that the middle temperature acidic electroless nickel deposits are bright, level, dense and uniform, and have 480 HV micro-hardness, 180 s plus spot corrosion time in nitrate solution, and 7.50% phosphorus content. The deposition rate is up to 20 (μm/h.) The middle-temperature acidic electroless nickel plating process can be compared with high temperature electroless nickel plating process.

关 键 词:化学镀镍 中温 酸性 络合剂 

分 类 号:TQ153.12[化学工程—电化学工业]

 

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