聚甲基倍半硅氧烷/粘土纳米复合材料  

STUDY ON POLYMETHYLSILSESQUIOXANE/CLAY NANOCOMPOSITE VIA IN SITU INTERCALATIVE POLYMERIZATION

作　　者：任建辉 郑学晶[2] 马军 阳明书[2] 施良和 徐坚 

机构地区：[1]高分子物理与化学国家重点实验室 [2]工程塑料国家重点实验室分子科学中心中科院化学研究所,北京100080

出　　处：《高分子材料科学与工程》2004年第4期188-190,194,共4页Polymer Materials Science & Engineering

基　　金：国家自然科学基金(20074039);国家863高技术项目;化学所高分子物理与化学国家重点实验室基金(00-B-01)

摘　　要：通过原位插层法制备了聚甲基倍半硅氧烷(PMSQ)/粘土插层型纳米复合材料。X射线衍射测定层间距由聚合前的1.9nm增大至3.4nm。复合材料的层间距经过150℃×3h热处理后无明显变化,经过300℃×3h热处理后层间距明显变小,根据在纳米受限空间内外的PMSQ化学结构对这一反常现象进行了分析。Polymethylsilsesquioxane (PMSQ)/montmorillonite (MMT) nanocomposites has been prepared by in situ intercalative polymerization. The dispersion of the MMT layers with the matrix was verified using X-ray diffraction, revealing an intercalated morphology with layer spacing (3.42) nm. The layer spacing was not increased after the annealing at 150 ℃ for 3 h and the reason was explained in the light of molecular structure of PMSQ synthesized in and out of the nano-confined environment. The coherent order of the silicate layer was decreased after the annealing and the reason was given in the light of the change of PMSQ molecule during the annealing process.

关 键 词：聚甲基倍半硅氧烷 粘土 纳米复合材料 纳米受限 原位插层法 

分 类 号：TB332[一般工业技术—材料科学与工程] TB383