Sb对直流反应磁控溅射制备TiO_2薄膜的影响  

Influence of Sb on TiO_2 Thin Films Grown by DC Reactive Magnetron Sputtering

作　　者：沃松涛[1] 沈杰[1] 蔡臻炜[1] 崔晓莉[1] 张群[1] 杨锡良[1] 章壮健[1] 

机构地区：[1]复旦大学材料科学系,上海200433

出　　处：《真空科学与技术学报》2004年第3期182-186,共5页Chinese Journal of Vacuum Science and Technology

摘　　要：用直流磁控溅射方法在Si(1 0 0 )面及载玻片上制备了Sb掺杂TiO2 薄膜。利用XRD光谱研究了Sb对其薄膜结晶情况的影响 ,用AFM观察其表面形貌 ,利用分光光度计测量了TiO2 薄膜的光学特性及其对亚甲基蓝的分解活性 ,通过测量和计算表面对水的接触角来衡量光致亲水性。研究结果表明纯TiO2 薄膜为锐钛矿型 ,适量Sb的掺杂能使TiO2 薄膜的结晶有显著改善 ,并出现Ti2 O3 和金红石相TiO2 ,薄膜的光催化活性和光致亲水性明显改善。随着掺杂量的增加 ,TiO2 薄膜的吸收边逐渐红移。但Sb掺杂过量时 ,破坏了二氧化钛原有的晶格结构 。Sb doped TiO 2 thin films were prepared on Si(100) wafers and microscope glass slides by DC reactive magnetron sputtering.The Sb concentration was controlled by adjusting the doping time.XRD patterns were used to study the influence of Sb on film crystallite and AFM to investigate their surface morphology.The optical transmission of the films and the degradation of methylene blue were measured by spectrophotometer.The hydrophilicity was avaluated by measuring water contact angle.We found that appropriate Sb doping is beneficial to crystallite and photo induced characteristic as well.Ti 2O 3 and TiO 2 in rutile phase are showed in XRD patterns.The adsorption edges of Sb doped films show a red shift.Overdoping of Sb is detrimental to the film crystallization and the film exhibits worse photocatalicity and hydrophilicity.

关 键 词：直流磁控溅射 二氧化钛 锑 红移 制备 掺杂 光催化活性 光致亲水性 晶格结构 

分 类 号：TN305.8[电子电信—物理电子学]