成像干涉光刻技术及其频域分析  

Imaging interferometric lithography and its spatial frequency analysis

作　　者：刘娟[1] 冯伯儒[1] 张锦[1] 

机构地区：[1]中国科学院光电技术研究所微细加工光学技术国家重点实验室

出　　处：《光电工程》2004年第10期24-27,共4页Opto-Electronic Engineering

基　　金：国家自然科学基金资助(60276043#)

摘　　要：传统光学光刻技术(OL)由于其固有的限制,虽然可对任意图形成像,但分辨力较低。无掩模激光干涉光刻技术(IL)的分辨力可达l /4,却局限于周期图形。成像干涉光刻技术(IIL)结合了二者的优点,用同一个系统分次传递物体不同的空间频率,能更有效地传递物体的信息,以高分辨力对任意图形成像。初步模拟研究表明,在同样的曝光波长和数值孔径下,对同样特征尺寸的掩模图形,IIL得到的结果好于OL。在CD=150nm时,IIL相对于OL把分辨力提高了1.5倍多。Conventional Optical Lithography (OL) has a lower resolution because of its inherent limits though it can image arbitrary patterns. Interferometric Lithography (IL) has a high resolution of l/4 but is restricted to periodic structure. Imaging Interferometric Lithography (IIL) integrates the merits of OL and IL, and transfers different components of spatial frequencies at different time and passes structure information more effectively thus imaging arbitrary patterns at high resolution. Initial modeling shows that IIL can image better than OL for the same features with same exposure wavelength and numerical aperture of imaging lens. When CD is 150nm, IIL improves the resolution for more than 1.5 times over OL.

关 键 词：成像干涉光刻 空间频率 频域分析 

分 类 号：TN305.7[电子电信—物理电子学]