基于ILDC理论的平面结构电磁散射计算  

EM Scattering Calculation of Planar Structure Based on the Theory of ILDC

作　　者：肖慧[1] 胡卫东[1] 

机构地区：[1]国防科技大学电子科学与工程学院重点实验室,长沙410073

出　　处：《电子对抗技术》2004年第5期26-31,共6页

摘　　要：增量长度绕射系数理论(ILDC)是对电大尺寸复杂目标进行边缘绕射计算的有效方法之一。本文基于散射总场、表面光学场和边缘绕射场三者之间的关系,针对几何建模的特点,从另一个角度推导出了ILDC在平表面结构中的应用形式,并验证了该方法的正确性,为目标电磁特性的研究提供了一种可行的计算方法。The theory of Incremental length diffraction coefficients (ILDC) is one of the efficient methods to calculate the edge diffraction of electrically large scaled complex objects. Allowing for the relationship of total scattered field, surface PO field and edge diffraction field and the characteristic of the geometry modeling, this paper brings forward another practical form of ILDC for the planar structures. The validity of the method, which can serve as a practical calculation method for the research of EM characteristics of objects, has been tested.

关 键 词：ILDC 边缘绕射 电磁散射 增量长度绕射系数 大尺寸 复杂目标 平面结构 几何建模 正确性 验证 

分 类 号：TN011[电子电信—物理电子学]