重氮树脂单层膜上铜的无电沉积  

Electroless Deposition of Cu on DR Monolayer

作　　者：张茂峰[1] 杨朝晖[1] 丛海林 曹维孝[1] 

机构地区：[1]北京大学化学与分子工程学院,北京100871

出　　处：《化学学报》2004年第21期2187-2190,共4页Acta Chimica Sinica

基　　金：国家自然科学基金(No.50173002)资项目助.

摘　　要：组装于硅片或玻璃片基片上的重氮树脂(DR)单层膜,吸附Sncl2,Pd催化剂后,通过无电沉积的方法,在这些基片上制备了铜膜.对得到的铜膜进行了SEM,XRD表征.通过选择性无电沉积,成功地制备了铜膜图像.The electroless deposition of copper on the monolayer film of diazoresin (DR), which was fabricated on the silicon or glass surface, was performed via absorbing SnCl2 and Pd on the DR film. The copper film was characterized with SEM and XRD showing that the electroless deposition of copper on the substrate is successful. Through the selective electroless deposition the Cu film pattern was obtained.

关 键 词：重氮树脂 单层膜 铜膜 铜膜图像 无电沉积 制备 催化剂 基片 

分 类 号：TN304[电子电信—物理电子学]