离子束溅射法制备Ti-Ni贮氢薄膜的研究  

PREPARATION OF Ti-Ni HYDROGEN STORAGE FILMS BY ION BEAM SPUTTERING

作　　者：张允什[1] 胡伟康[1] 王达[1] 袁华堂[1] 陈友孝 

机构地区：[1]南开大学

出　　处：《金属学报》1993年第1期B036-B038,共3页Acta Metallurgica Sinica

摘　　要：介绍了用离子束溅射制备贮氢薄膜的方法。采用钛板与镍板拼合靶制备的Ti—Ni薄膜为非晶态,具有良好的附着力和抗粉化能力,而晶化后的贮氢性能更好。Ti-Ni alloy hydrogen storage films, but particularly amorphous one at room temperature, were prepared by ion beam sputtering method with a composite target of Ti and Ni plate. The films have superior adhesion to substrate and anti-pulverizability. It was found that its hydrogen discharge capacity becomes higher after the amorphous film crystallized by annealing.

关 键 词：溅射 贮氢薄膜 钛镍合金 

分 类 号：TG139.7[一般工业技术—材料科学与工程]