ZnO纳米结构薄膜的三阶非线性折射特性  

Third-order Optical Nonlinear Refraction Properties of Nano-structured ZnO Film

作　　者：熊瑛[1] 汤国庆[1] 张桂兰[1] 杨保和[2] 陈希明[2] 

机构地区：[1]南开大学现代光学研究所,天津300071 [2]天津理工学院光电信息与电子工程系,天津300191

出　　处：《光电子．激光》2004年第11期1283-1286,共4页Journal of Optoelectronics·Laser

基　　金：国家自然科学基金资助项目(59672015;60276001);天津市教委科技发展基金资助项目(20010205);天津市自然科学基金重点资助项目(01380611)

摘　　要：采用直流溅射法在石英基片上制备了ZnO纳米结构薄膜。X射线衍射(XRD)谱表明ZnO尺寸约为5nm。利用Z 扫描技术,以锁模Nd:YAG激光器作光源(脉宽35ps,波长为355nm),在共振区域测定了ZnO纳米薄膜的三阶非线性光学常数,其非线性光学折射率常数n2=-5.7×10-8esu。Nano-structured ZnO film has been prepared by DC reactive magnetron sputtering on SiO2 glass substrate and investigated using XRD and a single beam Z-scan technique. (002) is the main diffraction peak in XRD spectrum. According the XRD spectrum of the ZnO film, the particle size is estimated to be about 5 nm. It is found that the most striking feature of the nano-structured film is that its third-order optical nonlinear refraction constant is measured to be as large as -5.7 × 10-8 esu with Z-scan method by the mode-locked frequency-doubled Nd:YAG laser system with a pulse duration of 35 ps at the wavelength of 355 nm.

关 键 词：三阶非线性 Z-扫描 共振区 折射 常数 直流溅射法 薄膜 ND:YAG激光器 锁模 脉宽 

分 类 号：TN248[电子电信—物理电子学] O484[理学—固体物理]