一种含有偶氮磺酸基与吡啶基的高分子氢键自组装及自组装超薄膜  

SELF-ASSEMBLY OF POLY(4-DIAZOSULFONATE STYRENE-co-4-VINYLPYRIDINE) VIA H-BONDING INTERACTION

作　　者：杨朝晖[1] 曹维孝[1] 

机构地区：[1]北京大学化学与分子工程学院,北京100871

出　　处：《高分子学报》2004年第5期776-779,共4页Acta Polymerica Sinica

基　　金：国家自然科学基金资助课题 (基金号 2 0 2 740 0 2 ;5 0 173 0 0 2 )

摘　　要：Poly(4-diazosulfonate styrene-co-4-vinylpyridine) (P(DSS-co-VP)),containing both H-acceptor moieties of pyridine and photosensitive diazosulfonate groups,was synthesized and has been used for self-assembly as a new component.The layer-by-layer deposition between P(DSS-co-VP)and m-methyl phenol formaldehyde resin (MPR) on a substrate via H-bonding interaction was investigated.After UV irradiation the stability of the multiplayer ultra thin film toward polar solvents is improved dramatically.The improvement of the solvent stability of the film should be attributed to the bond conversion between the layers of the film from H-bond to covalent bond under UV irradiation.Poly(4-diazosulfonate styrene-co-4-vinylpyridine) (P(DSS-co-VP)), containing both H-acceptor moieties of pyridine and photosensitive diazosulfonate groups,was synthesized and has been used for self-assembly as a new component. The layer-by-layer deposition between P(DSS-co-VP) and m-methyl phenol formaldehyde resin (MPR) on a substrate via H-bonding interaction was investigated. After UV irradiation the stability of the multiplayer ultra thin film toward polar solvents is improved dramatically. The improvement of the solvent stability of the film should be attributed to the bond conversion between the layers of the film from H-bond to covalent bond under UV irradiation.

关 键 词：高分子氢键自组装 自组装超薄膜 聚(4-偶氮磺酸基苯乙烯-co-4-乙烯基吡啶) 聚丙烯酸 聚苯胺 聚乙二醇 聚乙烯醇 重氮树脂 重氮基苯乙烯 

分 类 号：TB43[一般工业技术]