黄瓜耐弱光性状的QTL定位  

Identification of QTLs for Cucumber Poor Light Tolerance

作　　者：张海英[1] 陈青君[2] 王永健[1] 许勇[1] 张峰[1] 

机构地区：[1]国家蔬菜工程技术研究中心,北京100089 [2]新疆农业大学园艺系,乌鲁木齐830052

出　　处：《分子植物育种》2004年第6期795-799,共5页Molecular Plant Breeding

基　　金：北京市科技新星计划(954812800);北京市自然科学基金(5012006);国家863计划(2002AA244021、2002AA207012-3)资助。

摘　　要：应用'欧洲八号×秋棚'为亲本获得的重组自交系群体为材料,以叶面积增长量为鉴定指标,在弱光条件下(光照强度80μmol·m-2·s-1,光照时数8h白天/16h夜,温度25℃白天/18℃夜)对黄瓜的耐弱光性状进行了研究.发现该RIL群体的双亲在弱光条件下的叶面积增长量存在明显差异.应用该群体构建的具有234个标记位点的连锁图对控制黄瓜耐弱光的数量性状基因(QTL)进行了研究.共定位了5个叶面积增长量的QTL,每个QTL的贡献率在7.3%～20.2%之间.其中1个QTL显示正效加性效应,4个QTL显示负效加性效应.Using RIL population derived from No.8 European×QiuPeng, cucumber tolerance ability of low light (80?滋mol·m-2·s-1, 8h day/16h night,25℃ day/18℃ night) was evaluated using leaf area increase as evaluation index. The reaction of two parents was obvious difference. For QTL detection, the interval mapping method was employed based on a map with 234 markers, 5 putative QTLs which related to leaf area increase were detected, and the average percentage of variation explained for all QTLs are 7.3%~20.2%. One locus showed positive additive effect, while four loci showed negative additive effect.

关 键 词：黄瓜 耐弱光性状 QTL定位 数量性状 叶面积增长量 

分 类 号：S642.2[农业科学—蔬菜学]