Formation of Nanoscale Intermetallic Phases in Ni Surface Layer at High Intensity Implantation of Al Ions  

作　　者：I.A.Bozhko S.V.Fortuna I.A.Kurzina I.B.Stepanov E.V.Kozlov Yu.P.Sharkeev 

机构地区：[1]Tomsk State University of Architecture & Building,2 Solyanaya pl.,Tomsk 634003,Russia,Tomsk State University of Architecture & Building,2 Solyanaya pl.,Tomsk 634003,Russia,Tomsk State University of Architecture & Building,2 Solyanaya pl.,Tomsk 634003,Russia,Nuclear Physics Institute,Tomsk Polytechnic University,2a Lenin Str.,Tomsk 634050,Russia,Tomsk State University of Architecture & Building,2 Solyanaya pl.,Tomsk 634003.Russia,Institute of Strength Physics and Materials Science,Russian Academy of Sciences,2/1 Pr.Akademicheskii,Tomsk 634021,Russia

出　　处：《Journal of Materials Science & Technology》2004年第5期583-586,共4页材料科学技术（英文版）

摘　　要：The results of experimental study of nanoscale intermetallic formation in surface layer of a metal target at ion implantation are presented. To increase the thickness of the ion implanted surface layer the high intensive ion implantation is used. Compared with the ordinary ion implantation, the high intensive ion implantation allows a much thicker modified surface layer. Pure polycrystalline nickel was chosen as a target. Nickel samples were irradiated with Al ions on the vacuum-arc ion beam and plasma flow source 'Raduga-5'. It was shown that at the high intensity ion implantation the fine dispersed particles of Ni3AI, NiAl intermetallic compounds and solid solution Al in Ni are formed in the nickel surface layer of 200 nm and thicker. The formation of phases takes place in complete correspondence with the Ni-AI phase diagram.The results of experimental study of nanoscale intermetallic formation in surface layer of a metal target at ion implantation are presented. To increase the thickness of the ion implanted surface layer the high intensive ion implantation is used. Compared with the ordinary ion implantation, the high intensive ion implantation allows a much thicker modified surface layer. Pure polycrystalline nickel was chosen as a target. Nickel samples were irradiated with Al ions on the vacuum-arc ion beam and plasma flow source 'Raduga-5'. It was shown that at the high intensity ion implantation the fine dispersed particles of Ni3AI, NiAl intermetallic compounds and solid solution Al in Ni are formed in the nickel surface layer of 200 nm and thicker. The formation of phases takes place in complete correspondence with the Ni-AI phase diagram.

关 键 词：High intensive ion implantation Ion-plasma source Intermetallic nanophases 

分 类 号：TB383[一般工业技术—材料科学与工程]