表面热透镜技术测量3.8μm和2.8μm激光薄膜的微弱吸收  

Thin film weak absorption of 3.8μm and 2.8μm laser measured by surface thermal lensing technique

作　　者：江腾蛟[1] 黄伟[1] 齐文宗[1] 凌秀兰[2] 杨富[3] 张彬[1] 蔡邦维[1] 

机构地区：[1]四川大学电子信息学院,四川成都610064 [2]中国科学院光电技术研究所,四川双流610209 [3]河北北方学院物理系,河北张家口075028

出　　处：《强激光与粒子束》2004年第12期1497-1500,共4页High Power Laser and Particle Beams

基　　金：国防科技基础研究基金资助课题

摘　　要：　采用表面热透镜技术,对3.8μm和2.8μm激光辐照下镀制在Si基底上的单层ZnS,YbF3和YBC薄膜及不同膜系的YbF3/ZnS多层分光膜和多层高反膜,以及镀制在CaF2基底上的增透膜进行了吸收测量,并对3.8μm和2.8μm激光的测量结果进行了比较分析。实验结果表明,2.8μm波长下的吸收比3.8μm的大得多,两者之间约相差一个量级,测得的多层高反膜YbF3/ZnS薄膜在的3.8μm处的最低吸收为4.57×10-4,测量系统的灵敏度约为10-5。Using the surface thermal lensing technique, weak absorptions of different optical thin films, including the single-layer ZnS and YbF3 dielectric thin films with different thickness, as well as the different multilayer thin films YbF3/ZnS deposited on Si, and multilayer anti-reflectivity thin films YbF3/ZnS deposited on CaF2 window are measured. The experimental results of films irradiated by 3.8 μm and 2.8 μm lasers are compared and analyzed. The experimental results show that absorption at 2.8 μm, is much greater than the one at 3.8 μm, and the difference between them is one order of magnitude. The lowest absorption at 3.8 μm is 4.57 × 10-4, and the system sensitivity is 10-5 level.

关 键 词：表面热透镜技术 3.8μm激光 2.8μm激光 微弱吸收 光学薄膜 

分 类 号：O432.2[机械工程—光学工程]